2019 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN)
Sigray will be showcasing its products at the 2019 FCMN meeting. Experts, including our founder, Dr. Wenbing Yun, will be on hand to answer questions and provide information about the characterization solutions enabled by Sigray technologies. Join us for an exciting and informative event!
Sigray is a proud gold sponsor of the XNPIG conference, focused on grating-based imaging. Dr. Wenbing Yun will be presenting on Sigray's advances in components and system technology for x-ray phase imaging, including its revolutionary FAAST-Phase source designed for phase contrast imaging.
Dr. Yun will be presenting at the 5th Dresden Nanoanalysis Symposium held on the Fraunhofer Campus Dresden on September 1st, 2017.
Dr. Wenbing Yun will be presenting at ICO-24 in Tokyo, Japan.
Sigray will be attending and plans to discuss its high brightness FAAST source and advances in automated x-ray optics characterization.
Prof. Janos Kirz will be presenting Sigray's patented x-ray source and optics for high throughput x-ray crystallographic applications at the American Crystallographic Association held in New Orleans, Louisiana.
The ACA Meeting is an annual event providing scientists from a wide variety of backgrounds the opportunity to exchange cutting edge ideas and techniques in multiple areas of research. Each meeting highlights various aspects of crystallography and demonstrates their significance to the greater scientific community.
SH Lau, Vice President of Business Development at Sigray, will be delivering an oral presentation entitled "Non-invasive lab tool for micron-level trace element mapping and contamination analysis in FA & process control with capabilities comparable to synchrotron-based microXRF".
Dr. Yun will be attending the XOPT conference in Yokohama, Japan
SH Lau will be presenting on Sigray's latest developments for high throughput compositional mapping of trace elements and contaminants at micron-scale in micron-scale in wafer and packaging.
Dr. Wenbing Yun will be presenting at the NIST workshop on X-ray Metrology for the Semiconductor Industry in Gaithersburg, MD. Discussed in the workshop will be new approaches and techniques for Critical Dimension Small Angle X-ray Scattering (CD-SAXS).
Dr. Wenbing Yun will be attending as an invited speaker at IRSP 2016 and presenting on X-ray Microdiffraction with Structured Illumination for Strain Measurement in Nanoelectronics